Web* Startup Engineer leading the introduction of new process equipment within a new submicron wafer fab, primarily Applied Materials P5000. * Thin Film Process Expert: Dielectrics, tungsten, TiN/ Al sputtering and BPSG deposition. * Established Ellipsometric and Spectroscopic Measurement Systems. WebThe process of claim 13 wherein the doped glass film is a BPSG doped glass film. 17. The process of claim 2 wherein the oxide film includes carbon and nitrogen in concentrations each less than 0.5% atomic.
Implications of Surface Contaminants in a Bpsg …
WebHowever, two- or three layer BPSG stacks are more overcomplicated than useful. In fact, it is very difficult to control repeatability of the process, especially in terms of additive … WebTHE BPSG PROCESS :: SYSTEMATIC WEALTH. The members of the BPSG family are all experts in their field and on the cutting edge. They understand the power of a systematic … blson70
AME 5000 STANDARD OPERATING PROCEDURE
WebBPSG films are now routinely used as a Pre-Metal Dielectric (PMD) (another term used is Inter Layer Dielectric, ILD) between the polysilicon or silicide gate and the first level of ... temperature FA, which was a comparatively long process, sufficient for proper film softening and flow. In contrast, for sub-0.18 m ULSI circuits, it was ... WebSIPOS (Semi-Insulating Polycrystalline Silicon) is a Low Pressure Chemical Vapor Deposition (LPCVD) process for the deposition of high resistivity polysilicon layers, which are primarily used in the fabrication of high voltage semiconductor devices. SIPOS films overcome the disadvantages of SiO 2 films, such as accumulation of fixed ions and ... WebFeb 1, 2011 · In the process of chemically etching contact openings, film characteristics of the Borophosphosilicate glass (BPSG) film strongly effect the formation of an ideal contact profile. Ideal contact profiles represent a wine glass shape to provide better metal step coverage into the contact opening in comparison to a vertical sidewall profile. The … blsoil.com